Essential Photo Etching Considerations: Line Width & Metal Thickness

Part 2 of 3

Every metalworking process requires designers to understand certain variables to maximize the efficiency of that operation. Photo chemical etching is no exception.

That’s why we’ve been discussing important factors engineers should consider when designing for photo chemical etching.

In last week’s post, we discussed the relationship between metal thickness and hole size. This time around, we’ll learn about the relationship between line width and material thickness.

Metal Thickness and Line Width

 

Generally the width of metal between holes is not a particular problem for photo chemical etching, but designers will find some limitations when the space is the remaining surface area in a large field of slots or holes.

The relationship is best shown as follows:

THICKNESS (t) SPACE BETWEEN HOLES (w)
Less than .005" At least metal thickness
Over .005" At least 1.25 times metal thickness

This relationship is essential to any photo etched part design. Make sure your designs consider this; otherwise you might run into trouble during the photo etching process.

Come back next week to discuss the relationship between metal thickness and bevels.

Advanced photo etching tips design engineers should know.